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2003, Sensors and Actuators A: Physical
The paper is focused on the structuring of glass wafers to obtain high aspect ratio glass columns with high vertical profile for Micro Electro Mechanical Systems (MEMS). The technique proposed is to pattern columns by mechanical sawing. The sawing parameters have been optimised to achieve a high yield. Different dimensions of the column have been tested and glass columns down to 150 m × 150 m of cross-section and 700 m height have been obtained. They present high aspect ratio (>100) and very good vertical profile (88-90 • ). Hoya SD-2 and Corning Pyrex #7740 glass wafers have been processed with similar results. Different cleaning procedures have been tested to improve the anodic bondability of the samples after sawing. Machined glass columns have also been structured by commercial sand blasting technique and the results are also compared to the sawed samples. The glass wafers with machined columns have been anodically bonded to silicon. Anodic bonding characterisation of glass columns of different sections is also presented. Pull tests confirmed the good bondability of the glass columns.
Micromachines, 2016
This paper presents processes for glass micromachining, including sandblast, wet etching, reactive ion etching (RIE), and glass reflow techniques. The advantages as well as disadvantages of each method are presented and discussed in light of the experiments. Sandblast and wet etching techniques are simple processes but face difficulties in small and high-aspect-ratio structures. A sandblasted 2 cm ˆ2 cm Tempax glass wafer with an etching depth of approximately 150 µm is demonstrated. The Tempax glass structure with an etching depth and sides of approximately 20 µm was observed via the wet etching process. The most important aspect of this work was to develop RIE and glass reflow techniques. The current challenges of these methods are addressed here. Deep Tempax glass pillars having a smooth surface, vertical shapes, and a high aspect ratio of 10 with 1-µm-diameter glass pillars, a 2-µm pitch, and a 10-µm etched depth were achieved via the RIE technique. Through-silicon wafer interconnects, embedded inside the Tempax glass, are successfully demonstrated via the glass reflow technique. Glass reflow into large cavities (larger than 100 µm), a micro-trench (0.8-µm wide trench), and a micro-capillary (1-µm diameter) are investigated. An additional optimization of process flow was performed for glass penetration into micro-scale patterns.
Purpose-To present the aims and preliminary findings of a research project to investigate the manufacture of multilayer glass substrates built up from thin glass sheets. Design/methodology/approach-The approaches that may be taken to create glass substrates and the challenges involved are described. Excimer laser machining was used for the formation of microvias and other features in individual glass sheets. In addition, methods for the electroless copper metallisation of the smooth glass surfaces were studied. Finally, a technique for the lamination of the glass layers using low temperature, pressure assisted bonding was investigated. Findings-Microvias with 100 mm diameter entry holes were successfully machined in 100 mm thick glass sheets and process windows were identified to reduce debris and hole taper. Using appropriate pre-treatment steps, electroless copper coatings could be deposited uniformly over the smooth glass surface, however, further improvements in adhesion were found to be necessary. The direct lamination of glass layers was found to be possible using pressure and temperature applied over long periods of time. Improvements to the lamination process were made to reduce the initiation of cracks which were assessed using fatigue testing. Research limitations/implications-The feasibility of the individual steps in the fabrication of glass substrates has been demonstrated. Further work is necessary to control the processes in order to limit microcrack formation, improve copper coating adhesion and ensure uniform lamination of multiple glass layers. Originality/value-The use of glass materials could enable the manufacture of substrates for high density electrical interconnect with integrated optical waveguides.
The paper presents a review of the existing techniques of glass micromachining, explain the generation of the defects during wet etching process, proposed solution for the improving of wet etching techniques. Essential elements of glass wet etching process such as: influence of glass composition, etching rate, influence of the residual stress in the masking layer, characterization of the main masking materials, the quality of surface generated using wet etching process are analyzed. As a result of this analysis improved techniques for deep wet etching of glass are proposed. An 1 mm-thick Pyrex glass wafer was etched through using a composite mask of amorphous silicon/silicon carbide/ photoresist. From my knowledge this is the best result reported in the literature, in terms of deep etching of glass without defects generation. For achieving a smooth surface (for packaging applications) an optimal solution HF/HCl (10:1) was established for Pyrex and soda lime glasses. The paper presents also MEMS applications of the developed techniques.
Indonesian Journal of Electrical Engineering and Computer Science, 2016
By MEMS packaging test platform for bonding process of bonding temperature and bonding time, and test silicon specifications experimental study. Experimental results indicate that when the bonding voltage of 1200V, bonding temperature of 445 0 C to 455 0 C, bonding time is 60s, the void fraction is less than 5%. Glass and silicon wafer bonding quality can achieve the best. The experimental results in order to improve the glass silicon bonding quality provide the basis.
Materials Science and Engineering: A, 2004
A new processing route for the replication of high aspect ratio microstructures from a silicon wafer into a bulk metallic glass is presented. The approach bases on a casting process with separation of mold filling and quenching in time. Therefore a Zr-based bulk glass forming melt is applied onto a surface microstructured silicon mold with a protective layer, both at a temperature high enough to allow complete wetting of the wafer by the melt. Given enough time, open channels of high aspect ratios are completely filled by the melt which spreads over the wafer. From this state, the mold and the melt are quenched at a rate high enough to suppress crystallization of the glass forming melt. The resulting surface microstructured part out of bulk metallic glass with a high strength, a high elastic limit and good corrosion and abrasion resistance ideally meets the requirements of polymer microinjection molding tools. The wetting behavior of the Zr-based melt on the protective layer and the stability of the protective layer against dissolution in the melt are crucial to this new process and are studied for the alloy Zr 52.5 Cu 17.9 Ni 14.6 Al 10 Ti 5 and silicon wafer molds with different silicon oxide protective layers.
Micro and Nano Systems Letters
In this paper, a stress and fracture study, occurring during the chemical mechanical polishing (CMP) of anodically bonded substrates is presented. The samples contain glass pillars, used to form the glass cavities and a silicon substrate sealing the glass structure, the samples are fabricated using the anodic bonding process. The mechanical stresses of the bonded silicon substrate are simulated using the COMSOL software. The fracture strength after post-processing is investigated based on the criterion value, which is the ratio of the anodically bonded area over the cavity area. It is found that the bonded area and the distribution of pillars are related to the mechanical stability of the bonded substrate during the CMP process. Studies on the stability of subsequent processes, like CMP after anodic bonding, plays an important role in improving the fabrication yield of anodic bonded devices.
IEEE Access, 2018
A through-glass via (TGV) provides a vertical electrical connection through a glass substrate. TGVs are used in advanced packaging solutions, such as glass interposers and wafer-level packaging of microelectromechanical systems (MEMS). However, TGVs are challenging to realize because via holes in glass typically do not have a sufficiently high-quality sidewall profile for super-conformal electroplating of metal into the via holes. To overcome this problem, we demonstrate here that the via holes can instead be filled by magnetically assembling metal wires into them. This method was used to produce TGVs with a typical resistance of 64 m , which is comparable with other metal TGV types reported in the literature. In contrast to many TGV designs with a hollow center, the proposed TGVs can be more area efficient by allowing solder bump placement directly on top of the TGVs, which was demonstrated here using solderpaste jetting. The magnetic assembly process can be parallelized using an assembly robot, which was found to provide an opportunity for increased wafer-scale assembly speed. The aforementioned qualities of the magnetically assembled TGVs allow the realization of glass interposers and MEMS packages in different thicknesses without the drawbacks associated with the current TGV fabrication methods. INDEX TERMS Chip scale packaging, femtosecond laser, glass interposer, laser ablation, multichip modules, robotic assembly, self-assembly, spin-on glass, thermal expansion, through-glass via, throughsilicon vias, TSV.
Key Engineering Materials
Numerous optical applications have rising demands for ever increasing quantities from lighting and projection optics for modern vehicles to home or street lighting using LED technology. Glass is the material of choice for most of those application fields. It has several advantages over polymers, including heat and scratch resistance as well as longevity and recyclability. Non-isothermal glass molding has become a viable hot forming technology for mass production of optics. The major challenge is enabling a scalable replication process allowing the optical glass elements to be manufactured with high form accuracy and at low-cost production with low reject rates. This work introduces recent developments in glass optics manufacturing that allow the fulfilment of seemingly contradicting criteria: the economic growth and the need for less consumption of resources and energy. While single cavity non-isothermal molding is state-of-the-art, a manufacturing innovation through wafer-scale mol...
International Journal of Electrical Machining
Glass substrates were micromachined with standard needles and other self-made microtools. The machining can be described as electrochemical discharge machining (ECDM), where the needle or microtool (cathode) and an anode are dipped in electrolyte (NaOH) and connected to the output of a full rectifying wave generator with a current-limiting resistor. For micro machining a procedure is presented where glass and tool machining are integrated on the same machine. Microtools of arbitrary shapes were produced using Wire Electro-Discharge Grinding (WEDG). Furthermore, an experimental setup was made using a mini-robot with stick-slip actuators. This robot is positioned on a flat surface (XY<I» and has an additional piezo stick-slip unit (Z) for vertical displacement of cathode. Die-sinking and milling experiments, without rotation of tool, were done on cover glass in automatic and manual mode. Typical milling speeds were 0.5mmJs. Furthermore, several microtools produced with WEDG were attached to this mini-robot for glass machining.
Journal of Materials Processing Technology, 2009
Please cite this article in press as: Bourne, G.R., et al., Closed channel fabrication using micromolding of metallic glass.
Manufacturing Review
Electro-Chemical Discharge Machining (ECDM) process has the potential to machine various features and 3D surfaces on glass. However, machining of high aspect ratio micro holes is a challenging problem in ECDM process. In ECDM process, the machining rate mainly depends on the availability of the electrolyte at the electrode tip. Machining accuracy like taper, entry and exit diameter of the hole at high depths is rigorously affected due to lack of electrolyte at the machining zone resulting in more taperness. Low surface qualities (i.e. more over cut and tapered micro holes) are few limitations of the process. To enhance the machining capabilities a novel approach of PMECDM has been conducted. Present study is mainly focused on behavior of abrasive particles while machining soda lime glass, also studied effect of process parameters on the responses such as machining depth, outer diameter and aspect ratio. Also, the study led to analyze the effect of thermal properties of abrasives on ...
Journal of Micromechanics and Microengineering, 2016
In this study, we investigate the effects of CO 2 laser polishing on microscopic structures fabricated by femtosecond laser assisted carving (FLAC). FLAC is the peripheral laser irradiation of 2.5D structures suitable for low repetition rate lasers and is first used to define the microwell structures in fused silica followed by chemical etching. Subsequently, the bottom surface of patterned microwells is irradiated with a pulsed CO 2 laser. The surfaces were characterized using an atomic force microscope (AFM) and scanning electron microscope (SEM) in terms of roughness and high quality optical imaging before and after the CO 2 laser treatment. The AFM measurements show that the surface roughness improves more than threefold after CO 2 laser polishing, which promises good channel quality for applications that require optical imaging. In order to demonstrate the ability of this method to produce low surface roughness systems, we have fabricated a microfluidic channel. The channel is filled with polystyrene bead-laden fluid and imaged with transmission mode microscopy. The high quality optical images prove CO 2 laser processing as a practical method to reduce the surface roughness of microfluidic channels fabricated by femtosecond laser irradiation. We further compared the traditional and laser-based glass micromachining approaches, which includes FLAC followed by the CO 2 polishing technique.
Journal of Microelectromechanical Systems, 2013
This paper reports a new batch-mode fabrication process that combines glass and silicon into a single wafer. The technique requires only a single mask to lithographically define recesses in silicon using deep reactive ion etching. The patterned silicon wafer is anodically bonded to a glass wafer, and a hightemperature step reflows the glass into this silicon mold. The reflowed wafer stack is then planarized and thinned. Throughglass vias can be realized in this manner while additional processflow modifications enable features such as molded cavities in the glass. A capacitive pressure sensor and a hermetically sealed resonator are described to illustrate applications of the process. Finally, a three dimensional packaging technique for implantable biomedical microsystems is shown by vertically stacking glassin-silicon wafers. [2012-0348] Index Terms-Borosilicate glass, glass etching, silicon molding, anodic bonding, vertical interconnect, glass reflow, glass molding. I. Introduction B OROSILICATE glass is widely used in microelectromechanical systems due to its optical transparency, dielectric properties, and biocompatibility. The use of glass as a substrate also enables devices such as pressure sensors to utilize siliconglass anodic bonding to realize hermetic vacuum-sealed cavities [1]. Unfortunately, glass is difficult to micromachine; its most common etchant is hydrofluoric acid, which is isotropic and difficult to control. Silicon etching, on the other hand, has been studied for decades. Tools and process techniques have improved greatly, increasing yield and reducing cost. Typical silicon etchants such as XeF 2 (isotropic, gas-based) or ethylenediamine pyrocatechol (EDP) (anisotropic, wet-based) do not appreciably etch glass. Micromachining glass with high spatial resolution and repeatability at relatively low-cost remains challenging. Several techniques currently exist, including sandblasting [2], ultrasonic drilling [3], electrochemical etching [4], laser drilling Manuscript
Precision Engineering, 2009
Micro-electrochemical discharge machining (ECDM) was studied in order to improve the machining of 3D micro-structures of glass. To minimize structures and obtain good surface microstructures, the effects of the electrolyte, the pulse on/off-time ratio, the voltage, the feedrate, the rotational speed, and the electrolyte concentration in the drilling and milling processes were studied.In ECDM, voltage is applied to generate a gas film and sparks on a tool electrode; however, high voltage produces poor machining resolution. To obtain a stable gas film over the whole surface of the tool at a low voltage, a new mechanical contact detector, based on a loadcell, was used; the immersion depth of the tool electrode in the electrolyte was reduced as much as possible. In this study, various micro-structures less than 100 m in size, such as Ø 60 m micro-holes, a 10 m-thin wall, and a 3D micro-structure were fabricated to demonstrate the potential for micro-machining of glass by ECDM.
Laser induced backside wet etching (LIBWE), laser ablation with excimer lasers and laser chemical vapour deposition (LCVD) are flexible and precise laser processing methods for microstructuring of Pyrex glass. Different laser machined examples for applications in microsystem technology are presented and an outlook upon further possibilities is given.
2017 IEEE 67th Electronic Components and Technology Conference (ECTC), 2017
This paper describes an ultra-thin, low cost 3D glass sensor packaging platform for near-hermeticity with novel feedthrough and encapsulation technologies. Glass panels of thicknesses ranging from 50 µm to 300 µm are used which limits overall form factor to <0.7 mm. A process flow for fabrication of cavity/embedded sensor packages is described with demonstration three unique fundamental technologies. Vertical electrical feedthroughs are demonstrated using a lowcost conductive Transient Liquid Phase Sintering (TLPS) paste in a high throughput process. Lateral electrical feedthroughs embedded in polymer trenches are proposed for higher reliability, better coplanarity, reduced vulnerability to chemical corrosion and lower parasitics. Finally, four different adhesive polymers are explored to demonstrate a low temperature glass-glass panel bonding technique. Samples bonded at fixed conditions using the four polymers showed sufficiently high bond strength (>10 MPa) and Dow Chemical's Benzocyclobutene (BCB) 14-P005 is found to be the best candidate for panel level glass-glass bonding. Modelling of the proposed three-layer glass packaging platform was performed in COMSOL Multiphysics. Results show a maximum deformation of about 2.3 µm-2.5 µm in the BCB and GX-92 bonded package and the least average internal stress of 6.40 MPa in the BCB bonded package. The complete manufacturing cycle starting from cavity formation on bare glass to final 3D assembly to form the lidded/open cavity package including singulation is panel based, enabling significant cost reduction (depending on die dimensions and panel size) compared to ceramic and other substrate technologies.
TRANSDUCERS '03. 12th International Conference on Solid-State Sensors, Actuators and Microsystems. Digest of Technical Papers (Cat. No.03TH8664)
We present a novel process technology, which enables precision micro machining of glass wafers. With this Glass Flow Process GFP [1,2], which is based on viscous deformation at temperatures above the glass transition temperature T g , any surface topography available on a silicon substrate can be moulded into Borosilicate glasses, especially into bondable glasses like Borofloat 1 or Pyrex 2. Beside the replication of silicon structures this technique allows the fabrication of optical micro lens arrays with high aspect ratios and minimum spacing. Introducing this GFP technology to MEMS processing enables the deep structuring of glass substrates and opens a wide range of new applications. Optical quality micro lenses with saggital heights above 100 µm are demonstrated. In this paper an insight description of the GFP technology is given and the functionality of this new technology is presented by optical measurements of micro lens demonstrators.
MRS Proceedings, 2008
Among different MEMS wafer level bonding processes glass frit bonding provides reliable vacuum tight seals in volume production. The quality of the seal is a function of both seal glass materials and the processing parameters used in glass frit bonding. Therefore, in this study Taguchi L18 screening Design of Experiment (DOE) was used to study the effect of materials and process variables on the quality of the glass seal in 6” silicon wafers bonded in EVG520IS bonder. Six bonding process variables at three levels and two types of sealing glass pastes were considered. The seals were characterized by Scanning Acoustic Microscopy (SAM), cross sectional Scanning Electron Microscopy (SEM) and Energy Dispersive X-ray Analysis (EDAX). The results were quantified into four responses for DOE analysis. Key results are a) peak temperature has the strongest influence on seal properties, b) hot melt paste has significantly lower defects compared to liquid paste, and c) peak firing temperatures c...
2012
The micro-electronics industry is investigating glass as an alternative printed circuit board material and interposer. Electroless copper plating of glass is required for tracks and interconnects, but understanding of how the surface topography of the glass substrate affects the mechanics of the copper/glass bond quality is limited.
Sensors and Actuators A-physical, 1997
A simple testing method is presented that allows the comparison of the bond quality for anodically bonded wafers. An array of parallel metal lines of predetermined thickness is formed on a glass wafer. The estimation of the bond quality can be performed by visual inspection after the bonding. This method enables comparison of the anodic-bonding process performance for different glasses, for intermediate layers and various bonding conditions. The optimization of silicon-glass anodic bonding with an intermediate phosphosilicate glass (PSG) layer is shown using this technique.
Sensors and Actuators A: Physical, 2002
We have developed a novel (silicon-on-insulator (SOI), microelectromechanical systems (MEMS)) SOI±MEMS technology combined with anodic bonding process. A metal layer on the glass substrate can provide out-of-plane electrodes and interconnects. More importantly, a wafer-level package of mechanical structures constructed by the top layer of the SOI wafer can be formed by the glass substrate and the substrate layer of the SOI wafer simultaneously. The package can protect fragile mechanical structures during post-release processes, such as dicing, mounting and wire bonding as an ordinary IC wafer. In addition, the wafer-level package can directly provide a specialized package, such as a vacuum package for gyroscopes. No special process other than micromachining is needed. #
International Journal of Advanced Manufacturing Technology, 2009
Micro-abrasive jet machining (μ-AJM) is a fast and flexible technique for micro-patterning of brittle materials and can be combined with patterned mask made from a material with excellent photolithographic properties. Here, we demonstrate a fabrication method for the realization of a passive micromixer with third-dimensional feature by using a μ-AJM process with employing photopolymer as a mask on a glass slide target. We fabricated the mask using SU8, a photosensitive polymer, applied as a micro-pattern for μ-AJM process. The design and fabrication of the proposed micromixer is the first reported for such a device. Three glass layers were successfully bonded in a single step using a direct bonding method. These three bonded glass layers with micro-patterns etched on them were the realization of third-dimension feature on the micromixer design.
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